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Study of Al2O3 thin films by ALD using H2O and O3 as oxygen source for waveguide applications

Diana Laura Caballero-Espitia, E. Medina, H.A. Borbón-Núñez, O.E. Contreras-López, Hugo Tiznado, H. Márquez

2020Optical Materials17 citationsDOI

Topics & Concepts

X-ray photoelectron spectroscopyAtomic layer depositionFourier transform infrared spectroscopyEllipsometryRefractive indexMaterials scienceOxygenWaveguideThin filmAnalytical Chemistry (journal)SpectroscopyInfraredOptoelectronicsOpticsChemistryNanotechnologyChemical engineeringPhysicsQuantum mechanicsEngineeringOrganic chemistryChromatographySemiconductor materials and devicesPhotonic and Optical DevicesPhotorefractive and Nonlinear Optics
Study of Al2O3 thin films by ALD using H2O and O3 as oxygen source for waveguide applications | Litcius