Origins of wear-induced tungsten corrosion defects in semiconductor manufacturing during tungsten chemical mechanical polishing
Seung-Hoon Choi, Melissa E. Kreider, Adam C. Nielander, Michaela Burke Stevens, Gaurav A. Kamat, Ja Eung Koo, Ki Ho Bae, Ho‐Young Kim, Il Young Yoon, Bo Un Yoon, Kihyun Hwang, Dong Un Lee, Thomas F. Jaramillo
Topics & Concepts
Chemical-mechanical planarizationCorrosionPolishingMaterials scienceTungstenMetallurgyWaferSlurryDissolutionOxideComposite materialChemistryNanotechnologyPhysical chemistryAdvanced Surface Polishing TechniquesAdvanced materials and compositesHydrogen embrittlement and corrosion behaviors in metals