Effect of sputtering power on microstructure and corrosion properties of TiO2 films deposited by reactive magnetron sputtering
Bo Wang, Shicheng Wei, Lei Guo, Yujiang Wang, Yi Liang, Wei Huang, Fangjie Lu, Xianhua Chen, Fusheng Pan, Binshi Xu
Abstract
The effect of sputtering power on the microstructure, anti-corrosion and anti-fouling properties of TiO2 films deposited on 5083 aluminum (Al) alloy by reactive magnetron sputtering at room temperature were investigated systematically. The results show that the TiO2 film mainly consists of anatase, and it is composed of spherical shaped and pyramidal particles. Both the anti-corrosion and anti-bacterial properties first improve with increasing sputter power. As the power is 12 kW, the combination of anti-corrosion and anti-bacterial properties is the best, the corrosion potential (Ecorr), current density (Icorr), polarization resistance (Rp) and density of bacteria are −0.25 V, 0.36 μA/cm2, 2255.5 Ω/cm2 and 73 cell/mm2, respectively.