Evaluation of H<sub>2</sub> Plasma‐Induced Damage in Materials for EUV Lithography
Eun‐Seok Choe, Seungwook Choi, Ansoon Kim, Kwan‐Yong Kim, H. J. Yeom, Min Young Yoon, Seongwan Hong, Dong‐Wook Kim, Jung‐Hyung Kim, Hyo‐Chang Lee
Abstract
Abstract Ultrafine semiconductor fabrication by lithography has undergone a significant transition from deep ultraviolet (DUV) to extreme ultraviolet (EUV) processes, which presents new challenges. Specifically, the damage caused to components utilized in an EUV system, such as multilayer mirrors, reticles, and pellicles within lithography equipment, owing to EUV‐induced H 2 plasma, is a critical issue that directly affects the process yield and equipment lifespan. To address these issues, it is crucial to establish an environment similar to that of EUV‐induced plasma and develop a method to evaluate the resulting damage. Accordingly, an evaluation method is developed for assessing the material damage caused by hydrogen radicals and ions in inductively coupled H 2 plasma. In these systems, the electron density ranged from 5 × 10 8 to 3.5 × 10 10 cm −3 , the electron temperature ranged from 1 to 4 eV, and the ion energy ranged from several to tens of eV; these conditions closely align with the environment of an EUV‐induced H 2 plasma. The damage to Mo 2 C, a potential EUV pellicle material, is quantitatively analyzed by measuring the fraction of the pore area and examining the chemical characteristics after exposing the samples to various plasma conditions, including electron density, gas pressure, and exposure time.