Material combination of Tunnel-SiO2 with a (sub-)Monolayer of ALD-AlOx on silicon offering a highly passivating hole selective contact
Daniel Hiller, Philipp Hönicke, Dirk König
Topics & Concepts
PassivationSiliconMaterials scienceAtomic layer depositionMonolayerAnnealing (glass)OptoelectronicsAcceptorNanotechnologyLayer (electronics)Analytical Chemistry (journal)MineralogyChemistryMetallurgyChromatographyCondensed matter physicsPhysicsSemiconductor materials and devicesSilicon Nanostructures and PhotoluminescenceIntegrated Circuits and Semiconductor Failure Analysis