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Effect of additives on microstructure and properties of the coarsened layer of very low profile (HVLP) copper foil

Yan Xiao, Wan‐chang Sun, Zhong-bo Bai, Eryong Liu, Liangliang Du, Hui Cai, Liping Wang, Jing-pei Liu, Ya‐peng Jia, Jie Zhang

2023Journal of Applied Electrochemistry14 citationsDOI

Topics & Concepts

CopperCopper platingFOIL methodChemistryComposite numberSulfonateChemical engineeringElectrochemistryDielectric spectroscopyGelatinLayer (electronics)Inorganic chemistryMicrostructureMaterials scienceComposite materialSodiumOrganic chemistryElectrodeElectroplatingPhysical chemistryEngineeringElectrodeposition and Electroless CoatingsCopper Interconnects and ReliabilityCorrosion Behavior and Inhibition
Effect of additives on microstructure and properties of the coarsened layer of very low profile (HVLP) copper foil | Litcius