Role of twin defects on growth dynamics and size distribution of undoped and Si-doped GaAs nanowires by selective area epitaxy
Daniel Ruhstorfer, Markus Döblinger, Hubert Riedl, Jonathan J. Finley, Gregor Koblmüller
Abstract
We report the effects of Si doping on the growth dynamics and size distribution of entirely catalyst-free GaAs nanowire (NW) arrays grown by selective area molecular beam epitaxy on SiO2-masked Si (111) substrates. Surprising improvements in the NW-array uniformity are found with increasing Si doping, while the growth of undoped NWs appears in a metastable regime, evidenced by large size and shape distributions, and the simultaneous presence of crystallites with tetrahedral termination. Correlating scanning electron microscopy and transmission electron microscopy investigations, we propose that the size and shape distributions are strongly linked to the underlying twin defect formation probabilities that govern the growth. Under the present growth conditions, Si-doping of GaAs NWs leads to a very high twin defect formation probability (∼0.4), while undoped NWs exhibit a nearly threefold decreased probability (∼0.15). By adopting a model for facet-mediated growth, we describe how the altered twin formation probabilities impact the competing growth of the relevant low-index NW facets, and hence, NW size and shape. Our model is further supported by a generic Monte Carlo simulation approach to highlight the role of twin defects in reproducing the experimentally observed size distributions.