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Influence of magnetic field configuration on plasma characteristics and thin film properties in dual magnetron reactive high power impulse magnetron sputtering discharge with Al in Ar/O2 mixture

Guangxue Zhou, Langping Wang, Xiaofeng Wang, Yonghao Yu

2021Surface and Coatings Technology16 citationsDOI

Topics & Concepts

High-power impulse magnetron sputteringPlasmaAtomic physicsLangmuir probeCavity magnetronIonSputter depositionMaterials scienceAnalytical Chemistry (journal)Magnetic fieldSputteringThin filmPlasma diagnosticsChemistryPhysicsNanotechnologyOrganic chemistryChromatographyQuantum mechanicsMetal and Thin Film MechanicsDiamond and Carbon-based Materials ResearchPlasma Diagnostics and Applications
Influence of magnetic field configuration on plasma characteristics and thin film properties in dual magnetron reactive high power impulse magnetron sputtering discharge with Al in Ar/O2 mixture | Litcius