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Carbon Nanotube SRAM in 5-nm Technology Node Design, Optimization, and Performance Evaluation—Part II: CNT Interconnect Optimization

Rongmei Chen, Lin Chen, Jie Liang, Yuanqing Cheng, Souhir Elloumi, Jaehyun Lee, Kangwei Xu, Vihar Georgiev, Kai Ni, Peter Debacker, Asen Asenov, Aida Todri‐Sanial

2022IEEE Transactions on Very Large Scale Integration (VLSI) Systems13 citationsDOI

Abstract

The size and parameter optimization for the 5-nm carbon nanotube field effect transistor (CNFET) static random access memory (SRAM) cell was presented in Part I of this article. Based on that work, we propose a carbon nanotube (CNT) SRAM array composed of the schematically optimized CNFET SRAM and CNT interconnects. We consider the interconnects inside the CNFET SRAM cell composed of metallic single-wall CNT (M-SWCNT) bundles to represent the metal layers 0 and 1 (M0 and M1). We investigate the layout structure of CNFET SRAM cell considering CNFET devices, M-SWCNT interconnects, and metal electrode Palladium with CNT (Pd-CNT) contacts. Two versions of cell layout designs are explored and compared in terms of performance, stability, and power efficiency. Furthermore, we implement a 16 Kbit SRAM array composed of the proposed CNFET SRAM cells, multiwall CNT (MWCNTs) inter-cell interconnects and Pd-CNT contacts. Such an array shows significant advantages, with the read and write overall energy-delay product (EDP), static power consumption, and core area of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$0.28\times $ </tex-math></inline-formula> , <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$0.52\times $ </tex-math></inline-formula> , and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$0.76\times $ </tex-math></inline-formula> respectively to 7-nm FinFET-SRAM array with copper interconnects, whereas the read and write static noise margins are 6% and 12% respectively larger than the FinFET counterpart.

Topics & Concepts

Static random-access memoryCarbon nanotube field-effect transistorInterconnectionCarbon nanotubeTransistorMaterials scienceNanotechnologyComputer scienceField-effect transistorElectrical engineeringEngineeringComputer hardwareTelecommunicationsVoltageCarbon Nanotubes in CompositesLow-power high-performance VLSI designAdvancements in Semiconductor Devices and Circuit Design