The effect of non-ionic surfactants on the removal of cerium oxide particles in STI CMP post cleaning
Xinyu Zhao, Mei Yan, Fangyuan Wang, Xinyu Han, Baimei Tan, Jiadong Zhao, Renhao Liu, Yunhui Shi
Topics & Concepts
Materials scienceEthylenediaminetetraacetic acidWettingChemical engineeringChemical-mechanical planarizationScanning electron microscopeSurface tensionParticle (ecology)WaferOxideCleaning agentIonic bondingSurface modificationNanotechnologyPolishingComposite materialIonChemistryChelationMetallurgyOrganic chemistryOceanographyQuantum mechanicsGeologyEngineeringPhysicsAdvanced Surface Polishing TechniquesMinerals Flotation and Separation TechniquesElectronic and Structural Properties of Oxides