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Dual functionality of DTPMP and OHA: Enhancement in removal rates and excellent surface quality of cobalt CMP

Liunan She, Yingqi Di, Le Zhai, Jie Cheng, Guofeng Pan, Yuhang Qi

2024Electrochimica Acta16 citationsDOI

Topics & Concepts

CobaltDual (grammatical number)Quality (philosophy)ChemistryMaterials scienceChemical engineeringInorganic chemistryPhysicsEngineeringArtQuantum mechanicsLiteratureMetal and Thin Film MechanicsSemiconductor materials and devicesDiamond and Carbon-based Materials Research
Dual functionality of DTPMP and OHA: Enhancement in removal rates and excellent surface quality of cobalt CMP | Litcius