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Effective Schottky barrier height and interface trap density reduction engineering using 2-dimensional reduced graphene oxide interlayer for metal-interlayer-semiconductor contact structure

Sungjoo Song, Seung‐Hwan Kim, Seung-Geun Kim, Kyu-Hyun Han, Hyung-jun Kim, Hyun-Yong Yu

2022Journal of Alloys and Compounds18 citationsDOI

Topics & Concepts

GrapheneContact resistanceSchottky barrierMaterials scienceOxideSemiconductorPassivationNanoelectronicsNanotechnologyBand gapQuantum tunnellingExfoliation jointOptoelectronicsLayer (electronics)MetallurgyDiodeGraphene research and applicationsSemiconductor materials and devicesSemiconductor materials and interfaces
Effective Schottky barrier height and interface trap density reduction engineering using 2-dimensional reduced graphene oxide interlayer for metal-interlayer-semiconductor contact structure | Litcius