Dual modification of Co doped CeO2 abrasives for enhanced chemical mechanical polishing performance
Jiabao Cheng, Yunhui Shi, Yizhan Wang, Jiawei Qiu, Yao Xu, Yongxin Wang, Xinhuan Niu, Baimei Tan
Topics & Concepts
Materials scienceChemical-mechanical planarizationPolishingDopingDual (grammatical number)MetallurgyComposite materialOptoelectronicsLiteratureArtAdvanced Surface Polishing TechniquesAdvanced materials and compositesDiamond and Carbon-based Materials Research