Effects of optical aberrations on localization of MINFLUX super-resolution microscopy
Chenying He, Zhengyi Zhan, Chuankang Li, Xiaofan Sun, Yong Liu, Cuifang Kuang, Xü Liu
Abstract
A novel super-resolution imaging technique based on the minimum photon flux (MINFLUX), can achieve nanometer-scale localization precision and sub-5-nm imaging. However, aberrations can affect the localization performance and degrade the quality of reconstructed images. In this study, we analyze the effects of different low-order aberrations on the MINFLUX system through both theoretical limits and Monte Carlo methods. We report that 1) defocus and spherical aberration have little effect on 2D localization performance, whereas astigmatism and coma have significant negative effects; 2) system aberrations that can be measured in advance cause changes primarily in the magnitude and angular uniformity of localization precision, whereas sample-induced aberrations that cannot be a priori introduce large biases and reduce localization accuracy.