Benchmarking diamond surface preparation and fluorination via inductively coupled plasma-reactive ion etching
Tia Gray, Xiang Zhang, Abhijit Biswas, Tanguy Terlier, Eliezer Fernando Oliveira, Anand B. Puthirath, Chenxi Li, Tymofii S. Pieshkov, Elias Garratt, Mahesh R. Neupane, Bradford B. Pate, A. Glen Birdwell, Tony Ivanov, Róbert Vajtai, Pulickel M. Ajayan
Topics & Concepts
DiamondReactive-ion etchingX-ray photoelectron spectroscopySurface modificationMaterials scienceEtching (microfabrication)NanotechnologySecondary ion mass spectrometryInductively coupled plasmaContact angleAnalytical Chemistry (journal)PlasmaChemical engineeringOptoelectronicsChemistryIonLayer (electronics)Physical chemistryComposite materialOrganic chemistryPhysicsQuantum mechanicsEngineeringDiamond and Carbon-based Materials ResearchMetal and Thin Film MechanicsIon-surface interactions and analysis