Study on effect of complexing agents on Co oxidation/dissolution for chemical-mechanical polishing and cleaning process
Ohsung Kwon, Kiho Bae, Jinuk Byun, Taeho Lim, Jae Jeong Kim
Topics & Concepts
DissolutionEthylenediaminetetraacetic acidCitric acidChemistryChelationInorganic chemistryChemical-mechanical planarizationNuclear chemistryElectrochemistryOrganic chemistryLayer (electronics)Physical chemistryElectrodeAdvanced Surface Polishing TechniquesMetal Extraction and BioleachingElectronic and Structural Properties of Oxides