Optimization of a 65 nm CMOS imaging process for monolithic CMOS sensors for high energy physics
W. Snoeys, Gianluca Aglieri Rinella, A. Andronic, M. Antonelli, Roberto Baccomi, Rafael Ballabriga Sune, Marlon Barbero, Pierre Barrillon, J. Baudot, P. Becht, Franco Benotto, S. Beolè, G. Bertolone, Auguste Besson, W. Białas, G. Borghello, Justus Braach, M. D. Buckland, Szymon Bugiel, Eric Buschmann, Paolo Camerini, M. Campbell, F. Carnesecchi, Leonardo Cecconi, Edoardo Charbon, Ankur Chauhan, C. Colledani, Giacomo Contin, D. Dannheim, K. Dort, João Pacheco de Melo, W. Deng, Giuseppe De Robertis, Antonio Di Mauro, A. D. Martin, Andrei Dorokhov, Piotr Dorosz, G. H. Eberwein, Ziad El Bitar, Xiaochao Fang, Amos Fenigstein, C. Ferrero, Denis Fougeron, D. Gajanana, Mathieu Goffe, L. Gonella, A. Grelli, Владимир Громов, A. Habib, A. Haim, K. Hansen, Jan Anton Hasenbichler, H. Hillemanns, Geun Hee Hong, Christine Hu, А. Исаков, Kimmo Jaaskelainen, Antoine Junique, Artem Kotliarov, Iraklis Kremastiotis, F. Křížek, Alexander Kluge, Ruud Kluit, Gabriela Kucharska, T. Kugathasan, Y. Kwon, P. La Rocca, Lukas Lautner, Pedro Leitao, Bong-Hwi Lim, F. Loddo, M. Mager, Davide Marras, Paolo Martinengo, Silvia Masciocchi, Soniya Mathew, Marius Wilm Menzel, Frédéric Morel, Budi Mulyanto, Magdalena Münker, Luciano Musa, Masayuki NAKAMURA, Patrick Pangaud, Stefania Perciballi, Hung Pham, Francesco Piro, Francesco Prino, Sasha Rachevski, Karolina Rebane, Christian Reckleben, F. Reidt, R. Ricci, Roberto Russo, I. Sanna, Valerio Sarritzu, Umberto Savino, David Schledewitz, Iain Sedgwick, Hans Kristian Soltveit, Serhiy Senyukov
Abstract
The long term goal of the CERN Experimental Physics Department R&D on monolithic sensors is the development of sub-100nm CMOS sensors for high energy physics. The first technology selected is the TPSCo 65nm CMOS imaging technology. A first submission MLR1 included several small test chips with sensor and circuit prototypes and transistor test structures. One of the main questions to be addressed was how to optimize the sensor in the presence of significant in-pixel circuitry. In this paper this optimization is described as well as the experimental results from the MLR1 run confirming its effectiveness. A second submission investigating wafer-scale stitching has just been completed. This work has been carried out in strong synergy with the ITS3 upgrade of the ALICE experiment.