Study on material removal mechanism in ultrasonic chemical assisted polishing of silicon carbide
Xin Chen, Yingdong Liang, Zhijie Cui, Fanwei Meng, Chao Zhang, Liaoyuan Chen, Tianbiao Yu, Ji Zhao
Topics & Concepts
Materials sciencePolishingSilicon carbideUltrasonic sensorMechanism (biology)Composite materialCarbideSiliconChemical-mechanical planarizationMetallurgyAcousticsEpistemologyPhysicsPhilosophyAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchElectronic and Structural Properties of Oxides