Tribological behavior of 6H–SiC wafers in different chemical mechanical polishing slurries
Qixiang Zhang, Jisheng Pan, Xiaowei Zhang, Jiabin Lu, Qiusheng Yan
Topics & Concepts
Materials scienceSlurryChemical-mechanical planarizationAbrasivePolishingSurface roughnessTribologyWaferComposite materialSurface finishMetallurgyNanotechnologyAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchAdvanced ceramic materials synthesis