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Photoelectric In-Memory Logic and Computing Achieved in HfO<sub>2</sub>-Based Ferroelectric Optoelectronic Memcapacitors

Ning Liu, Jiuren Zhou, Siying Zheng, Faxin Jin, Cizhe Fang, Bing Chen, Yan Liu, Yue Hao, Genquan Han

2024IEEE Electron Device Letters10 citationsDOI

Abstract

We experimentally reported the photoelectric in-memory logic and computing capabilities of HfO2-based ferroelectric optoelectronic memcapacitors (FOMs). By optimizing the annealing process at 600 °C, we achieve a robust noise margin and a substantial photoelectric memory window exceeding 9 fF/μm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> , accompanied by an exceptionally low static energy cost below an attojoule per operation. Subsequently, our FOMs gained the capability for reconfigurable photoelectric in-memory Boolean logics of “NAND/NOT” and neuromorphic computing-based hand-written digit image recognition with an accuracy of 92%. These results signify a significant advancement towards energy-efficient sensing-memory-computing electronics, promising next-generation applications in pattern recognition, machine vision, and beyond.

Topics & Concepts

Neuromorphic engineeringOptoelectronicsComputer scienceCognitive computingLogic gatePhotoelectric effectNAND gateFerroelectricityElectronic engineeringElectrical engineeringMaterials scienceArtificial intelligenceEngineeringAlgorithmArtificial neural networkNeuroscienceBiologyCognitionDielectricAdvanced Memory and Neural ComputingFerroelectric and Negative Capacitance DevicesSemiconductor materials and devices
Photoelectric In-Memory Logic and Computing Achieved in HfO<sub>2</sub>-Based Ferroelectric Optoelectronic Memcapacitors | Litcius