Litcius/Paper detail

Deep-Level Traps in AlGaN/GaN- and AlInN/GaN-Based HEMTs With Different Buffer Doping Technologies

P. Vigneshwara Raja, Mohamed Bouslama, Sujan Sarkar, Khade Ramdas Pandurang, Jean‐Christophe Nallatamby, Nandita DasGupta, Amitava DasGupta

2020IEEE Transactions on Electron Devices69 citationsDOI

Abstract

Deep-level traps in AlGaN/GaNand AlInN/GaN-based HEMTs with different buffer doping technologies are identified by drain current transient spectroscopy (DCTS) and low-frequency (LF) output admittance (Y <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">22</sub> ) dispersion techniques. TCAD simulations are also carried out to determine the spatial location and type of traps. The DCTS and LF Y <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">22</sub> measurements on Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.25</sub> Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.75</sub> N/GaN HEMT (Fe-doped buffer) reveal a single electron trap at EC - 0.47 eV. On the other hand, an electron trap at E <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">C</sub> - (0.53-0.59) eV and a deep hole trap at EV + 0.82 eV are detected in Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.845</sub> In <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.155</sub> N/AlN/GaN HEMT with unintentionally doped (UID) buffer, while a slow detrapping behavior is noticed at E <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">C</sub> - 0.6 eV in Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.83</sub> In <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.17</sub> N/AlN/GaN HEMT with C-doped buffer. The DCTS and LF Y <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">22</sub> measurements yield nearly the same trap signatures, indicating the reliability of the trap characterization techniques used in this article. The simulated LF Y <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">22</sub> characteristics show that all these traps are acceptor-like states located in the buffer layer. The identified trap parameters in various buffers may be helpful to improve the crystalline quality of the epitaxial buffer layers.

Topics & Concepts

High-electron-mobility transistorDopingOptoelectronicsMaterials sciencePhysicsAnalytical Chemistry (journal)Topology (electrical circuits)Electrical engineeringChemistryTransistorEngineeringQuantum mechanicsOrganic chemistryVoltageGaN-based semiconductor devices and materialsSemiconductor Quantum Structures and DevicesZnO doping and properties