Wafer-sized WS<sub>2</sub> monolayer deposition by sputtering
Michelle Marie S. Villamayor, Sajid Husain, Reinier Oropesa‐Nuñez, Fredrik O. L. Johansson, Rebecka Lindblad, Pedro Lourenço, Romain Bernard, Nadine Witkowski, Geoffroy Prévot, F. Sorgenfrei, Erika Giangrisostomi, Alexander Föhlisch, Peter Svedlindh, Andreas Lindblad, Tomas Nyberg
Abstract
Radio frequency sputtering by argon ions on a target consisting of tungsten disulphide can create a single layer of the compound on a 4′′ Si-wafer with one W atom per two S atoms when including hydrogen sulphide in the sputtering atmosphere.
Topics & Concepts
MonolayerWaferSputteringMaterials scienceDeposition (geology)NanotechnologyOptoelectronicsThin filmGeologySedimentPaleontology2D Materials and ApplicationsMXene and MAX Phase MaterialsPerovskite Materials and Applications