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A tag-and-count approach for quantifying surface silanol densities on fused silica based on atomic layer deposition and high-sensitivity low-energy ion scattering

Tahereh G. Avval, Stanislav Průša, Cody V. Cushman, Grant T. Hodges, Sarah Fearn, Seong H. Kim, Jan Čechal, Elena Vaníčková, Pavel Bábík, Tomáš Šikola, Hidde H. Brongersma, Matthew R. Linford

2022Applied Surface Science16 citationsDOIOpen Access PDF

Topics & Concepts

SilanolX-ray photoelectron spectroscopyChemistryAtomic layer depositionAnalytical Chemistry (journal)Hydrofluoric acidLow-energy ion scatteringInorganic chemistryIonLayer (electronics)Chemical engineeringOrganic chemistryEngineeringCatalysisSemiconductor materials and devicesIon-surface interactions and analysisElectronic and Structural Properties of Oxides
A tag-and-count approach for quantifying surface silanol densities on fused silica based on atomic layer deposition and high-sensitivity low-energy ion scattering | Litcius