A tag-and-count approach for quantifying surface silanol densities on fused silica based on atomic layer deposition and high-sensitivity low-energy ion scattering
Tahereh G. Avval, Stanislav Průša, Cody V. Cushman, Grant T. Hodges, Sarah Fearn, Seong H. Kim, Jan Čechal, Elena Vaníčková, Pavel Bábík, Tomáš Šikola, Hidde H. Brongersma, Matthew R. Linford
Topics & Concepts
SilanolX-ray photoelectron spectroscopyChemistryAtomic layer depositionAnalytical Chemistry (journal)Hydrofluoric acidLow-energy ion scatteringInorganic chemistryIonLayer (electronics)Chemical engineeringOrganic chemistryEngineeringCatalysisSemiconductor materials and devicesIon-surface interactions and analysisElectronic and Structural Properties of Oxides