Characterization of SiO<sub>2</sub> Over Poly-Si Mask Etching in Ar/C<sub>4</sub>F<sub>8</sub> Capacitively Coupled Plasma
Inho Seong, Jang Jae Lee, Chul‐Hee Cho, Yeong Seok Lee, Sijun Kim, S. J. You
Abstract
International audience
Topics & Concepts
Etching (microfabrication)Characterization (materials science)Materials sciencePlasmaCapacitively coupled plasmaAnalytical Chemistry (journal)OptoelectronicsInductively coupled plasmaChemistryNanotechnologyLayer (electronics)PhysicsQuantum mechanicsChromatographyPlasma Diagnostics and ApplicationsMetal and Thin Film MechanicsSemiconductor materials and devices