Understanding ZIF particle chemical etching dynamics and morphology manipulation: <i>in situ</i> liquid phase electron microscopy and 3D electron tomography application
Qiang Chang, Dahai Yang, Xingyu Zhang, Zihao Ou, Juyeong Kim, Liang Tong, Junhao Chen, Sheng Cheng, Lixun Cheng, Binghui Ge, Edison Huixiang Ang, Hongfa Xiang, Mufan Li, Xiaohui Song
Abstract
experiments demonstrate that the outer layer etches faster leading to overall volume shrinking (stage I) while the inner layer etches faster giving a hollow morphology (stage II), although both the outer layer and inner layer have been etched in the whole process. 3D electron tomography was used to quantify the properties of the hollow structures which show that the ZIF-67 crystal etching rate is larger than that of the ZIF-8 crystal at the same pH value. This study provides valuable insights into MOF particle morphology control and can lead to the development of novel MOF-based materials with tailored properties for various applications.