A revisit from CVD kinetics to CVD reactor: Investigating uniform growth mechanism of polysilicon in a reduction furnace
Wei Si, Ning Wang, Yuan Zong, Gance Dai, Fanzheng Meng, Zuodong Yang, Ling Zhao, Zhong Xin, Guangjing Jiang
Topics & Concepts
Chemical vapor depositionRodInletDeposition (geology)Mixing (physics)Flux (metallurgy)Reduction (mathematics)Materials scienceProcess (computing)Chemical engineeringMole fractionMechanicsChemistryNuclear engineeringNanotechnologyMechanical engineeringEngineeringMetallurgyPhysical chemistryPhysicsComputer scienceMedicineAlternative medicineMathematicsQuantum mechanicsPathologyOperating systemGeometryBiologySedimentPaleontologySilicon and Solar Cell TechnologiesMetallurgical Processes and ThermodynamicsSilicon Carbide Semiconductor Technologies