Trends in photoresist materials for extreme ultraviolet lithography: A review
Xiaolin Wang, Peipei Tao, Qianqian Wang, Rongbo Zhao, Tianqi Liu, Yang Hu, Ziyu Hu, Yimeng Wang, Jianlong Wang, Yaping Tang, Hong Xu, Xiangming He
Topics & Concepts
Extreme ultraviolet lithographyResistPhotoresistExtreme ultravioletLithographyMaterials scienceNanotechnologyMicroelectronicsPhotolithographyBrightnessNext-generation lithographyReticleMultiple patterningOpticsOptoelectronicsElectron-beam lithographyWaferLaserPhysicsLayer (electronics)Advancements in Photolithography TechniquesIntegrated Circuits and Semiconductor Failure AnalysisNanofabrication and Lithography Techniques