Investigation of the etching mechanism of silicon nitride by CF4/O2/Ar gas mixture plasma in ICP
Liyue Gong, Qian Luo, Ziyan Tan, Chan Li, Na Li, Xinjie Wang, Fei Gao, Yong-Xin Liu, Zhenhua Bi, Xianxiu Mei
Topics & Concepts
Etching (microfabrication)PlasmaSilicon nitrideMaterials scienceNitrideSiliconReactive-ion etchingPlasma etchingMechanism (biology)Analytical Chemistry (journal)ChemistryOptoelectronicsNanotechnologyLayer (electronics)Environmental chemistryQuantum mechanicsPhilosophyEpistemologyPhysicsPlasma Diagnostics and ApplicationsMetal and Thin Film MechanicsSemiconductor materials and devices