Trivalent lanthanum and ytterbium doped meso-silica/ceria abrasive systems toward chemical mechanical polishing (CMP) and ultraviolet irradiation-assisted photochemical mechanical polishing (PCMP)
Zihan Kou, Chao Wang, Wenjin Zhou, Ailian Chen, Yang Chen, Yang Chen
Topics & Concepts
Materials sciencePolishingChemical-mechanical planarizationScanning electron microscopeAbrasiveUltravioletComposite materialTransmission electron microscopyRaman spectroscopyAbrasion (mechanical)IrradiationChemical engineeringNanotechnologyOptoelectronicsOpticsPhysicsEngineeringNuclear physicsAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchAdvanced materials and composites