Optical bandgap control in Al2O3/TiO2 heterostructures by plasma enhanced atomic layer deposition: Toward quantizing structures and tailored binary oxides
Pallabi Paul, Md. Golam Hafiz, P. Schmitt, Christian Patzig, Félix Otto, Torsten Fritz, Andreas Tünnermann, Adriana Szeghalmi
Topics & Concepts
Atomic layer depositionHeterojunctionMaterials scienceBand gapOptoelectronicsX-ray photoelectron spectroscopyRefractive indexThin filmEllipsometryOpticsNanotechnologyChemical engineeringPhysicsEngineeringSemiconductor materials and devicesZnO doping and propertiesElectronic and Structural Properties of Oxides