Etching and annealing treatment to improve the plasma-deposited SiOx film adhesion force
Ruixue Wang, Zhangchuang Xia, Xianghao Kong, Lihong Liang, Kostya Ostrikov
Topics & Concepts
Materials scienceAnnealing (glass)Composite materialPlasma etchingThin filmAnalytical Chemistry (journal)NanotechnologyEtching (microfabrication)ChemistryChromatographyLayer (electronics)Plasma Diagnostics and ApplicationsPlasma Applications and DiagnosticsSurface Modification and Superhydrophobicity