Enhancing accuracy of alignment measurement in lithography using two-dimensional desirable sidelobe convolution window
Feifan Xu, Songtao Chang, Jin Zhang, Chengliang Pan, Haojie Xia
Topics & Concepts
Window (computing)Convolution (computer science)LithographyWindow functionOpticsProcess windowComputer scienceAlgorithmPhysicsArtificial intelligenceComputer visionFilter (signal processing)Operating systemArtificial neural networkAdvanced X-ray Imaging TechniquesOptical measurement and interference techniquesAdvancements in Photolithography Techniques