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Deformation behaviors and inverse Hall-Petch effect in nanoindentation of silicon: An atomistic simulation study with experimental validation

Yachao Wang, Md. Akram Minhaj, Xinnan Wang, Jing Shi

2021Journal of Manufacturing Processes15 citationsDOI

Topics & Concepts

NanoindentationMonocrystalline siliconMaterials scienceIndentationSiliconPolycrystalline siliconGrain sizeCrystalliteGrain boundaryNanocrystalline siliconComposite materialCrystallographyMetallurgyCrystalline siliconMicrostructureAmorphous siliconChemistryThin-film transistorLayer (electronics)Metal and Thin Film MechanicsAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials Research
Deformation behaviors and inverse Hall-Petch effect in nanoindentation of silicon: An atomistic simulation study with experimental validation | Litcius