The role of nitrogen addition in C4F8/Ar plasma to modulate the plasma process from polymerization to etching
Woojin Park, Jonggu Han, Solee Park, Se Youn Moon
Topics & Concepts
Etching (microfabrication)Substrate (aquarium)Plasma etchingPlasmaX-ray photoelectron spectroscopyPolymerNitrogenFluorocarbonMoleculeLayer (electronics)ChemistryFluorinePlasma processingOxygenAnalytical Chemistry (journal)Deposition (geology)PolymerizationChemical engineeringOrganic chemistryOceanographyPhysicsSedimentGeologyEngineeringQuantum mechanicsPaleontologyBiologyPlasma Diagnostics and ApplicationsMetal and Thin Film MechanicsDiamond and Carbon-based Materials Research