Maskless lithography based on oblique scanning of point array with digital distortion correction
Hung-Laing Chien, Yi-Hsien Chiu, Yung-Chun Lee
Topics & Concepts
Distortion (music)Digital micromirror deviceOpticsMaskless lithographyPinhole (optics)Materials scienceMicrolensLithographyPhotomaskProjection (relational algebra)Digital Light ProcessingOblique casePhotolithographyImage qualityPhotoresistLens (geology)Computer scienceOptoelectronicsArtificial intelligencePhysicsResistImage (mathematics)NanotechnologyElectron-beam lithographyLayer (electronics)LinguisticsCMOSAmplifierProjectorAlgorithmPhilosophyOptical measurement and interference techniquesAdvancements in Photolithography TechniquesAdvanced Measurement and Metrology Techniques