Deep metal-assisted chemical etching using a porous monolithic AgAu layer to develop neutral-colored transparent silicon photovoltaics
HyeonOh Shin, Kangmin Lee, Jinhong Mun, Deok‐Ho Roh, Eunhye Hwang, Jeonghwan Park, Geunsik Lee, Kwanyong Seo, Tae‐Hyuk Kwon
Abstract
We report deep metal-assisted chemical etching using a porous monolithic AgAu layer on crystalline silicon as an alternative to the expensive deep reactive ion etching for fabricating neutral-colored transparent crystalline silicon photovoltaics.
Topics & Concepts
Etching (microfabrication)Porous siliconSiliconMaterials scienceIsotropic etchingPhotovoltaicsLayer (electronics)Deep reactive-ion etchingPorosityMetalCrystalline siliconOptoelectronicsNanotechnologyReactive-ion etchingPhotovoltaic systemComposite materialMetallurgyElectrical engineeringEngineeringNanowire Synthesis and ApplicationsSilicon Nanostructures and PhotoluminescenceThin-Film Transistor Technologies