Properties and device performance of BN thin films grown on GaN by pulsed laser deposition
Abhijit Biswas, Mingfei Xu, Kai Fu, Jingan Zhou, Rui Xu, Anand B. Puthirath, Jordan A. Hachtel, Chenxi Li, Sathvik Ajay Iyengar, Harikishan Kannan, Xiang Zhang, Tia Gray, Róbert Vajtai, A. Glen Birdwell, Mahesh R. Neupane, Dmitry Ruzmetov, Pankaj B. Shah, Tony Ivanov, Hanyu Zhu, Yuji Zhao, Pulickel M. Ajayan
Abstract
Wide and ultrawide-bandgap semiconductors lie at the heart of next-generation high-power, high-frequency electronics. Here, we report the growth of ultrawide-bandgap boron nitride (BN) thin films on wide-bandgap gallium nitride (GaN) by pulsed laser deposition. Comprehensive spectroscopic (core level and valence band x-ray photoelectron spectroscopy, Fourier-transform infrared spectroscopy, and Raman) and microscopic (atomic force microscopy and scanning transmission electron microscopy) characterizations confirm the growth of BN thin films on GaN. Optically, we observed that the BN/GaN heterostructure is second-harmonic generation active. Moreover, we fabricated the BN/GaN heterostructure-based Schottky diode that demonstrates rectifying characteristics, lower turn-on voltage, and an improved breakdown capability (∼234 V) as compared to GaN (∼168 V), owing to the higher breakdown electrical field of BN. Our approach is an early step toward bridging the gap between wide and ultrawide-bandgap materials for potential optoelectronics as well as next-generation high-power electronics.