Design, modeling, and analysis of a novel XY micro-displacement scanning stage with an elliptical compliant restraint mechanism
X Zhang, Weipeng Li, Shuai Li, Yan Zheng
Abstract
Abstract This paper presents a novel piezoelectric XY micro-displacement scanning stage (MDSS), which features a parallel structure based on compliant mechanisms and has a compact configuration. Since the coupling problem between two motion axes, an innovative elliptical compliant restraint mechanism (ECRM) with a compact layout is proposed and utilized in XY MDSS to obtain high motion accuracy. And the XY MDSS can realize compact structure and lower input stiffness for a large workspace owing to the ECRM simultaneously. Due to the limited displacement of the piezoelectric stack actuator, compliant amplification mechanism is applied to achieve a large stroke. In order to estimate the static and dynamic characteristics theoretically, Castigliano’s second theorem and Lagrange’s method are utilized to establish the analytical models of the newfangled ECRM, compliant amplification mechanism, and XY MDSS. The finite element analysis and experimental tests are carried out to evaluate the performances of XY XDSS, and the results are all in correspondence with analytic solutions, which further validate the correctness of the analytical modeling methodologies. Experimental results show that the XY MDSS can realize a workspace of 58.8 μ m × 51.5 μ m with a resonance frequency of 576.5 Hz and nanometer-level resolution. The effectiveness of the designed ECRM is also proved simultaneously, which could well limit the coupling motion. The theoretical studies, finite element analysis, and experimental testing all demonstrate that the designed XY MDSS with ECRM has good performance while having a compact structure.