Phase formation in magnetron sputtered CrMnFeCoNi high entropy alloy
León Zendejas Medina, Lars Riekehr, Ulf Jansson
Abstract
Thin films of the CrMnFeCoNi high entropy alloy were deposited by magnetron sputtering from a sintered equimolar target. The substrate temperature and bias were varied during deposition, and the structure, morphology and elemental distribution were studied in detail. All films formed phase mixtures of multiple crystal structures. This contrasts with studies on the bulk alloy, where it typically forms a single phase with a simple cubic closed packed (ccp) structure, with other phases precipitating only after long annealing times. For higher substrate temperatures, we observed a mixture of phases with ccp and bcc (body centered cubic) structures, and the intermetallic phases σ-phase and L10, the first three being the predicted equilibrium phases at the deposition temperature. For room temperature depositions, we found evidence of very limited diffusion of metal atoms during the deposition. These films formed a mixture of a ccp and the intermetallic χ-phase. Two mechanisms can be distinguished that govern the phase formation at lower and higher temperatures. From the present results and comparisons with the literature, we also discuss why the small grain size, the low process temperature, and the fast surface diffusion during synthesis causes magnetron sputtering to yield different results compared to bulk synthesis from the melt. These principles explain why it is easier to form the equilibrium phases by sputtering, and why a single ccp phase should not be expected as a rule for this deposition method. Following the thermodynamic principles of high entropy alloys, this may also be the case in other high entropy alloy systems.