A novel stable zinc–oxo cluster for advanced lithography patterning
Youming Si, Yingdong Zhao, Guangyue Shi, Danhong Zhou, Feng Luo, Pengzhong Chen, Jiangli Fan, Xiaojun Peng
Abstract
Single crystal X-ray diffraction analysis showed a Zn–VBA with a size of 2.2 nm, in line with advanced lithography technology requirements. The introduction of benzoic acid ligands resulted in high thermal stability, good solubility, and good film-forming capability.
Topics & Concepts
LithographyThermal stabilityZincMaterials scienceCluster (spacecraft)DiffractionNanotechnologyCrystallographyOptoelectronicsChemistryOpticsComputer scienceOrganic chemistryPhysicsMetallurgyProgramming languageBlock Copolymer Self-AssemblyCorrosion Behavior and InhibitionAdvancements in Photolithography Techniques