Properties of a new TiTaZrHfW( N) refractory high entropy film deposited by reactive DC pulsed magnetron sputtering
Abdelhakim Bouissil, Sofiane Achache, Djallel Eddine Touaibia, Benoît Panicaud, Mohammad Arab Pour Yazdi, Frédéric Sanchette, Mohamed El Garah
Topics & Concepts
Materials scienceNitrideSputteringSputter depositionAmorphous solidThermal stabilityAnalytical Chemistry (journal)Thin filmRefractory metalsArgonNitrogenComposite materialMetallurgyChemical engineeringNanotechnologyCrystallographyAtomic physicsEngineeringPhysicsQuantum mechanicsChromatographyChemistryLayer (electronics)High Entropy Alloys StudiesMetal and Thin Film MechanicsHigh-Temperature Coating Behaviors