Angular distribution measurement of high-energy argon neutral and ion in a 13.56 MHz capacitively-coupled plasma
Keita Ichikawa, Manh Hung Chu, Makoto Moriyama, Naoya Nakahara, Haruka Suzuki, Daiki Iino, Hiroyuki Fukumizu, Kazuaki Kurihara, Hirotaka Toyoda
Abstract
Angular distributions of high energy neutrals and ions, impinging on an RF-biased electrode in a 13.56 MHz capacitively-coupled argon plasma were investigated. Ions and neutrals were introduced into a drift chamber that was directly connected to the RF electrode. A two-dimensional beam image was measured by a micro-channel plate. Neutral and ion beams were separated by an electrostatic deflector in the drift chamber. Angular distribution widths for ion and neutral were less than 1° at self-bias voltages above 300 V and monotonically decreased with increasing the self-bias voltage. Neutral angular distribution width was larger than that of ion, irrespective of self-bias voltage.