Reduced amount of contamination particle generated by CF4/Ar/O2 plasma corrosion of Y2O3 materials: Influence of defluorination process
MinJoong Kim, Eunmi Choi, Jongho So, Seonjeong Maeng, Chin‐Wook Chung, Song-Moon Suh, Ju‐Young Yun
Topics & Concepts
Materials scienceEtching (microfabrication)X-ray photoelectron spectroscopyParticle (ecology)PlasmaContaminationCorrosionParticle sizeLayer (electronics)Pulmonary surfactantScanning electron microscopePlasma etchingAnalytical Chemistry (journal)PolishingChemical engineeringMetallurgyComposite materialEnvironmental chemistryChemistryBiologyGeologyEngineeringQuantum mechanicsOceanographyEcologyPhysicsHigh-Temperature Coating BehaviorsDiamond and Carbon-based Materials ResearchPlasma Diagnostics and Applications