An operando ORP-EIS study of the copper reduction reaction supported by thiourea and chlorides as electrorefining additives
Thomas Collet, Noël Hallemans, Benny Wouters, Kristof Ramharter, John Lataire, Rik Pintelon, Annick Hubin
Topics & Concepts
ElectrowinningThioureaCopperChemistryInorganic chemistryRedoxReduction potentialThioamideElectrochemistryElectrolyteElectrodeOrganic chemistryPhysical chemistryElectrodeposition and Electroless CoatingsCorrosion Behavior and InhibitionElectrochemical Analysis and Applications