Hydrogen Behavior at Crystalline/Amorphous Interface of Transparent Oxide Semiconductor and Its Effects on Carrier Transport and Crystallization
Julia E. Medvedeva, Kapil Sharma, Bishal Bhattarai, Mariana I. Bertoni
Abstract
The role of disorder and particularly of the interfacial region between crystalline and amorphous phases of indium oxide in the formation of hydrogen defects with covalent (In–OH) or ionic (In–H–In) bonding are investigated using ab initio molecular dynamics and hybrid density-functional approaches. The results reveal that disorder stabilizes In–H–In defects even in the stoichiometric amorphous oxide and also promotes the formation of deep electron traps adjacent to In–OH defects. Furthermore, below-room-temperature fluctuations help switch interfacial In–H–In into In–OH, creating a new deep state in the process. This H-defect transformation limits not only the number of free carriers but also the grain size, as observed experimentally in heavily H-doped sputtered In2Ox. On the other hand, the presence of In–OH helps break O2 defects, abundant in the disordered indium oxide, and thus contributes to faster crystallization rates. The divergent electronic properties of the ionic vs covalent H defects─passivation of undercoordinated In atoms vs creation of new deep electron traps, respectively─and the different behavior of the two types of H defects during crystallization suggest that the resulting macroscopic properties of H-doped indium oxide are governed by the relative concentrations of the In–H–In and In–OH defects. The microscopic understanding of the H defect formation and properties developed in this work serves as a foundation for future research efforts to find ways to control H species during deposition.