Review of the effect and progress in uniform films prepared by the magnetron sputtering method
Xinhang Wang, Aobo Wang, Jun Gao, Zhengwang Cheng, Mei Wang, Baozhang Zhao, Wei Zou, Xinguo Ma
Abstract
This highlight reviews the latest advances in the preparation of uniform films through magnetron sputtering. It provides a detailed discussion on the effects, characterizations, influence factors and optimization of film thickness and uniformity.
Topics & Concepts
High-power impulse magnetron sputteringMaterials scienceSputter depositionSputteringCavity magnetronEngineering physicsOptoelectronicsNanotechnologyChemical engineeringProcess engineeringThin filmEngineeringCopper Interconnects and ReliabilityMaterial Properties and Applications