A special electrostatic self-assembly structure of colloidal silica: Improving Chemical Mechanical Polishing performance
Xianglong Zhang, Xianghui Li, Ni Meng, Shenao Nie, Yuxuan Qiu, Ying Wei, Mingyan Xu, Xin Li, Kehua Dai, Yangang He
Topics & Concepts
Materials scienceChemical-mechanical planarizationSurface modificationX-ray photoelectron spectroscopyColloidal silicaAbrasiveChemical engineeringPolishingWaferScanning electron microscopeAdsorptionSurface roughnessColloidNanotechnologyCoatingComposite materialOrganic chemistryChemistryEngineeringAdvanced Surface Polishing TechniquesForce Microscopy Techniques and ApplicationsDiamond and Carbon-based Materials Research