Past, Present, and Future Outlook for Edge Isolation Processes in Highly Efficient Silicon Solar Cell Manufacturing
Tobias Dannenberg, Jan Vollmer, Michael Passig, Caroline Scheiwe, Damian Brunner, Alexis Pediaditakis, Ulrich Jäger, Iron Wang, Weiwei Xie, Su-Fan Xu, Jim S. Wu, Katrin Krieg, Christopher Teßmann, Martin Zimmer, H. Kühnlein
Abstract
This work highlights present research and mass production results of wet‐chemical solutions for industrial edge isolation of silicon solar cells, aiming for a reduction of nitric acid consumption and production costs as well as a simultaneous increase in efficiency. All processes are applied to either industrially passivated emitter and rear contact (PERC) or tunnel oxide‐passivated contact (TOPCon) solar cells. Herein, a review of different edge isolation techniques in the history of silicon solar cell processing is presented. Subsequently, novel wet‐chemical approaches are focused on, namely 1) HNO 3 ‐reduced edge isolation (InOxSide Fusion), 2) HNO 3 ‐free edge isolation (InOxSide Blue), and 3) batch cluster solution—a combination of an acidic inline and an alkaline batch tool for emitter edge isolation of PERC and TOPCon solar cells. For each of the approaches, cell results and total cost of ownership estimations are presented. Based on all findings, a comprehensive discussion between inline versus batch‐cluster processing is presented. All investigations are performed on industrial equipment, wafer sizes, and a solar cell efficiency level of above 23%.