MOCVD growth of (010) β-(AlxGa1−x)2O3 thin films
A F M Anhar Uddin Bhuiyan, Zixuan Feng, Lingyu Meng, Hongping Zhao
Topics & Concepts
Metalorganic vapour phase epitaxyMaterials scienceChemical vapor depositionThin filmMolar ratioGrowth rateVolumetric flow rateChamber pressureMorphology (biology)Analytical Chemistry (journal)MineralogyEpitaxyNanotechnologyLayer (electronics)MetallurgyChemistryCatalysisBiologyThermodynamicsOrganic chemistryGeometryPhysicsGeneticsMathematicsGa2O3 and related materialsZnO doping and propertiesElectronic and Structural Properties of Oxides