RF magnetron sputtering of Ga2 O3 thin films: Analysis of oxygen flow rate impact on stoichiometry, structural, optical characteristics, and energy band alignments
Mandira Biswas, Dariskhem Pyngrope, Shiv Kumar, Shubhankar Majumdar, Ankush Bag
Topics & Concepts
Materials scienceThin filmStoichiometryAnalytical Chemistry (journal)X-ray photoelectron spectroscopySputteringBand gapSputter depositionSapphireVolumetric flow rateOptoelectronicsOpticsNanotechnologyChemical engineeringChemistryLaserChromatographyOrganic chemistryQuantum mechanicsPhysicsEngineeringGa2O3 and related materialsZnO doping and propertiesElectronic and Structural Properties of Oxides